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Thermopower analysis of metal-insulator transition temperature modulations in vanadium dioxide thin films with lattice distortion

机译:具有晶格畸变的二氧化钒薄膜中金属-绝缘体转变温度调制的热功率分析

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摘要

Insulator-to-metal (MI) phase transition in vanadium dioxide (VO2) thin films with controlled lattice distortion was investigated by thermopower measurements. VO2 epitaxial films with different crystallographic orientations, grown on (0001) alpha-Al2O3, (11 (2) over bar0) alpha-Al2O3, and (001) TiO2 substrates, showed significant decrease of absolute value of Seebeck coefficient (S) from similar to 200 to 23 mu VK-1, along with a sharp drop in electrical resistivity (rho), due to the transition from an insulator to a metal. The MI transition temperatures observed both in rho(T-rho) and S(T-S) for the VO2 films systematically decrease with lattice shrinkage in the pseudorutile structure along the c axis, accompanying a broadening of the MI transition temperature width. Moreover, the onset T-S, where the insulating phase starts to become metallic, is much lower than the onset T-rho. This difference is attributed to the sensitivity of S for the detection of hidden metallic domains in the majority insulating phase, which cannot be detected in rho measurements. Consequently, S measurements provide a straightforward and excellent approach for a deeper understanding of the MI transition process in VO2.
机译:通过热功率测量研究了具有受控晶格畸变的二氧化钒(VO2)薄膜中的绝缘体到金属(MI)相变。在(0001)alpha-Al2O3,(bar0)(11(2)在bar0)alpha-Al2O3和(001)TiO2衬底上生长的具有不同晶体学取向的VO2外延膜显示出塞贝克系数(S)的绝对值与相似值相比显着降低VK-1达到200至23μV,并且由于从绝缘体到金属的转变,电阻率(rho)急剧下降。 VO2薄膜在rho(T-rho)和S(T-S)中观察到的MI转变温度随着伪c-金红石结构沿c轴的晶格收缩而系统降低,并伴随着MI转变温度宽度的扩大。此外,绝缘相开始变成金属的起始T-S比起始T-rho低得多。这种差异归因于S对大多数绝缘相中隐藏的金属畴的检测灵敏度,这在rho测量中无法检测到。因此,S测量为深入了解VO2中的MI过渡过程提供了一种直接而出色的方法。

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